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[期刊论文] 作者:BI Da-Wei,ZHANG Zheng-Xuan,ZHA, 来源:中国物理C 年份:2004
The total dose radiation response of pseudo-MOS transistors fabricated in hardened and unhardened FD (fully-depleted) SIMOX (Separation by Implanted Oxygen) SOI...
[期刊论文] 作者:HUANG Hui-Xiang,BI Da-Wei,PENG Chao,ZHANG Yan-Wei,ZHANG Zheng-Xuan, 来源:中国物理快报(英文版) 年份:2013
An anomalous total dose effect is observed in narrow-width devices fabricated in a 0.2μm partially-depleted silicon-on-insulator (SOI) technology.The previous...
[期刊论文] 作者:PENG Chao,ZHANG Zheng-Xuan,HU Zhi-Yuan,HUANG Hui-Xiang,NING Bing-Xu,BI Da-Wei, 来源:中国物理快报(英文版) 年份:2013
The total ionizing dose effects of partially depleted silicon-on-insulator (SOI) transistors in a 0.13 μm technology are studied by 60 Co γ-ray irradiation.Ra...
[期刊论文] 作者:Peng Chao,Hu Zhi-Yuan,Ning Bing-Xu,Huang Hui-Xiang,Fan Shuang,Zhang Zheng-Xuan,Bi Da-Wei, 来源:中国物理B(英文版) 年份:2014
[期刊论文] 作者:Hu Zhi-Yuan,Liu Zhang-Li,Shao-Hua,Zhang Zheng-Xuan,Ning Bing-Xu,Chen Ming,Bi Da-Wei,Zou Shi-Chang, 来源:中国物理B(英文版) 年份:2011
[期刊论文] 作者:Liu Zhang-Li,Hu Zhi-Yuan,Zhang Zheng-Xuan,Shao Hua,Chen Ming,Bi Da-Wei,Ning Bing-Xu,Zou Shi-Chang, 来源:中国物理B(英文版) 年份:2011
[期刊论文] 作者:LIU Zhang-Li,HU Zhi-Yuan,ZHANG Zheng-Xuan,SHAO Hua,NING Bing-Xu,BI Da-Wei,CHEN Ming,ZOU Shi-Chang, 来源:中国物理快报(英文版) 年份:2011
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