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[期刊论文] 作者:LI Hong-xuan XU Tao HAO Jun-yi, 来源:中国有色金属学会会刊:英文版 年份:2004
Carbon nitride films were deposited on Si (100) substrates using plasma-enhanced chemical vapor deposition (PECVD) technique from CH4 and N2 at different applie...
[期刊论文] 作者:LI Hong-xuan,XU Tao,HAO Jun-yi, 来源:中国有色金属学会会刊(英文版) 年份:2004
Carbon nitride films were deposited on Si (100) substrates using plasma-enhanced chemical vapor deposition (PECVD) technique from CH4 and N2 at different applie...
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