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[期刊论文] 作者:J.Reece Roth,Z.Y.Chen,Peter P.-Y.Tsai, 来源:金属学报(英文版) 年份:2001
Direct exposure of samples to the active species of air generated by a One AtmosphereUniform Glow Discharge Plasma (OA UGDP) has been used to etch and to increa...
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