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Resistless photochemical etching of a silicon wafer by UV laser with an H2O2 and HF aqueous solution
[期刊论文] 作者：YANG Jie,LIU Yanfa,M.Murahara,
来源：科学通报 年份：2004
A new resistless etching method has been developed for Silicon wafers. This new method uses an aqueous solution consisting of hydrogen peroxide (H2O2) and hydro...
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