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,A Polymer-Rich Re-deposition Technique for Non-volatile Etching By-products in Reactive Ion Etching
[期刊论文] 作者：A.Limcharoen,C.Pakpum,P.Limsuwan,
来源：中国物理快报（英文版） 年份：2013
Re-deposition is a non-volatile etching by-product in reactive ion etching systems that is well known to cause dirt on etching work.In this study,we propose a n...
[期刊论文] 作者：P.Jantawongrit,S.Sanorpim,H.Yaguchi,M.Orihara,P.Limsuwan,,
来源：Journal of Semiconductors 年份：2015
InN film was grown on 4H-SiC(0001) substrate by RF plasma-assisted molecular beam epitaxy(RFMBE).Priorto the growth of InN film,an InN buffer layer with a thick...
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