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Atomic Diffusion and Interface Reaction of Cu/Si(111) Films Prepared by Ionized Cluster Beam Deposit
[会议论文] 作者:B.Cao,G.P.Li,S.J.Cho,H.Kim,
来源:The 17th International Conference on Surface Modification of 年份:2011
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Atomic Diffusion and Interface Reaction of Cu/Si(111) Films Prepared by Ionized Cluster Beam Deposit
[会议论文] 作者:B.Cao,G.P.Li,S.J.Cho,H.Kim,
来源:The 17th International Conference on Surface Modification of 年份:2011
...
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