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[期刊论文] 作者：YuChen,ShishengXiong,
来源：InternationalJournalofExtremeManufacturing 年份：2020
Directed self-assembly (DSA) emerges as one of the most promising new patterning techniques for single digit miniaturization and next generation lithography. DSA achieves high-resolution patterning by molecular assembly that circumvents the......
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