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[会议论文] 作者：Kentaro Tomita,Yuta Sato,Toshiaki Eguchi,Syoichi Tsukiyama,Kiichiro Uchino,Tatsuya Yanagida,Hiroaki Tomuro,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
Extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm is expected to be the promising technology for semiconductor manufacturing aimed at a node size of the dynamic random-access memory (DR...
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