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,ANALYSIS OF THE X-RAY PHOTOELECTRON SPECTRA OFrna-SiOCF FILMS PREPARED BY PLASMA-ENHANCEDrnCHEMICAL
[期刊论文] 作者：DING SHI-JIN,WANG PENG-FEI,ZHANG WEI,WANG JI-TAO,WEI WILLIAM LEE,
来源：中国物理(英文版) 年份：2001
The preparation of a-SiOCF films from Si(OC2H5)4, C4F8 and/or Ar using the plasma-enhanced chemical vapourdeposition method is reported. The chemical bonding s...
,FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Che
[期刊论文] 作者：WANG Peng-Fei,DING Shi-Jin,ZHANG Wei,ZHANG Jian-Yun,WANGJi-Tao,WEI William Lee,
来源：中国物理快报（英文版） 年份：2000
Fluorine doped silicon dioxide (SiOF) thin films have been prepared by plasma enhanced chemical vapor depo sition. The Fourier transform infrared spectrometry (...
[期刊论文] 作者：DING SHI-JIN,WANG PENG-FEI,ZHANG WEI,WANG JI-TAO,WEI WILLIAM LEE,ZHANG YE-WEN,KIA ZHONG-FU,
来源：中国物理(英文版) 年份：2000
With the development of ultralarge scale integrated circuit, new interlayer dielectrics with low dielectric constant for multilevel interconnections are require...
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