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[期刊论文] 作者：LI Jun-Shuai,YIN Min,WANG Jin-Xiao,HE De-Yan,
来源：中国物理快报（英文版） 年份：2005
Silicon thin films are deposited by inductively coupled plasma chemical vapour deposition (ICP-CVD) at a low temperature of 350℃ using a mixture of SiH4 and H2...
,Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposit
[期刊论文] 作者：LI Jun-Shuai,WANG Jin-Xiao,YIN Min,GAO Ping-Qi,HE De-Yan,
来源：中国物理快报（英文版） 年份：2006
Polycrystalline Si (poly-Si) films are in situ grown on Al-coated glass substrates by inductively coupled plasma chemical vapour deposition at a temperature as...
,Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasm
[期刊论文] 作者：Wang Jin-Xiao,Qin Yan-Li,Yan Heng-Qing,Gao Ping-Qi,Li Jun-Shuai,Yin Min,He De-Yan,
来源：中国物理B（英文版） 年份：2009
Silicon films were grown on aluminium-coated glass by inductively coupled plasma CVD at room temperature using a mixture of SiHa and H2 as the source gas. The m...
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