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[期刊论文] 作者：LI Jing,LIU YuHong,DAI YuanJing,YUE DaChuan,LU XinChun,LUO JianBin,,
来源：Science China(Technological Sciences) 年份：2013
During the ultra large scale integration(ULSI)process,the surface roughness of the polished silicon wafer plays an important role in the quality and rate of pro...
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