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Effect of oxygen flow rate on the properties of SiOx films deposited by reactive magnetron sputterin
[期刊论文] 作者：FachunLai,MingLi,HaiqianWang,YousongJiang,YizhouSong,
来源：ChineseOpticsLetters 年份：2005
SiOx (x=0--2) films were deposited on BK-7 substrates by a low frequency reactive magnetron sputtering system with the oxygen flow rate (OFR) changing from 0 to 30 sccm. The samples were characterized by atomic force microscopy, spectrophot......
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