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[会议论文] 作者：Tian Shu-ping,Sun Wei-zhong,Zhang yan-po,Zhao Cheng-li,Chen Feng,F.Gou,
来源：第十五届全国等离子体科学技术会议 年份：2011
During fabricating hydrogenated silicon films using plasma enhanced chemical vapor deposition method (PECVD),the interactions between SiH3+ ions and surfaces signifincantly affect performances of the...
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