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Effects of pulsed bias on TiO2 thin films prepared on glass and silicon by arc ion plating and simul
[会议论文] 作者:Min Zhang,Guoqiang Lin,Chuang Dong,
来源:2011年第三届微电子及等离子体技术国际会议 年份:2011
TiO2 thin films were fabricated on glass and p-(100) silicon substrates by arc ion plating.The effects of pulsed negative bias on phase and growth of TiO2 films were investigated by applying a pulsed...
[会议论文] 作者:Min Zhang,Guoqiang Lin,Chuang Dong,Kwang Ho Kim,
来源:9th Asia-Pacific Conference on Plasma Science and Technology 年份:2008
Ternary TiNbN composite coatings were deposited on high-speed steel by pulsed bias arc ion plating.Substrate bias varied from-300V to-900V to investigate th...
[会议论文] 作者:Min Zhang,Guoqiang Lin,Chuang Dong,Chengsen Liu,Mengke Li,Zhigang Shao,
来源:The 11th International Workshop on Plasma-Based Ion Implanta 年份:2011
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