研究了石墨球数为490-1 100个/mm~2在280℃和360℃奥氏体等温淬火的ADI基体上沉积PVD-TiN涂层,在300℃用电弧离子喷涂工艺进行沉积......

研究了石墨球数为490-1 100个/mm-2在280℃和360℃奥氏体等温淬火的ADI基体上沉积PVD-TiN涂层,在300℃用电弧离子喷涂工艺进行沉积......

Ni-Cr-Al alloy was deposited by electron beam-physical vapor deposition(EB-PVD) method. The microstructure was investiga......