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The Investigation of Cr-Al-Si-N Films Deposited on Cemented Carbide Substrates for High-speed Dry Cu
【机 构】
:
School of Materials Science and Engineering,Anhui University of Technology,Maanshan 243002,China
【出 处】
:
The 8th Asian-European International Conference on Plasma Su
【发表日期】
:
2011年1期
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