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概述了活性反应离子沉积过程,应用单因素优选与正交试验相结合的方法,探讨氮气分压、活化电流、离化电压、基体温度等对活性反应离子沉积氮化钛层性能的影响,分析了工艺参数间的相互作用。
The reactive reactive ion deposition process was summarized. The influence of nitrogen partial pressure, activation current, ionization voltage and substrate temperature on the performance of titanium nitride layer by reactive reactive ion deposition was investigated by single factor optimization and orthogonal test. The interaction between process parameters.