论文部分内容阅读
Experimental Determination of the Edge and Potential Profile in the Sheath of Negatively Biased Wall
【机 构】
：
CASKeyLaboratoryofBasicPlasmaPhysicsandDepartmentofModemPhysics,UniversityofScienceandTechnologyofCh
【出 处】
：
9th Asia-Pacific Conference on Plasma Science and Technology
【发表日期】
：
2008年10期
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