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5. Investigation on the Carbon/Chronium Film Using a Hybrid High Power Pulse Magnetron Sputtering Techn

Investigation on the Carbon/Chronium Film Using a Hybrid High Power Pulse Magnetron Sputtering Techn

来源 :The 11th International Workshop on Plasma-Based Ion Implanta | 被引量 : 0次 | 上传用户：sunjf2008

【作 者】

：

Xueqian Zhang Peiling Ke Dong Zhang Aiying Wang 

【机 构】

：

Division of Surface Engineering, Ningbo Institute of Materials Technology and Engineering, Chinese A

【出 处】

：

The 11th International Workshop on Plasma-Based Ion Implanta

【发表日期】

：

2011年3期

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