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在研究材料的表面性质时,总希望获得一个理想的完整表面,以排除各种外来干扰和影响。实际上,半导体材料表面往往有各种缺陷,或者存在着由于各种处理所带来的损伤。因此,在努力揭示半导体表面本征特性的同时,也需要研究缺陷和损伤所带来的一些非本征的特性,亦即研究这些缺陷和损伤对材料表面本征特性的影响。
When studying the surface properties of materials, it is always desirable to have an ideal, complete surface to exclude all types of external disturbances and effects. In fact, the surface of semiconductor materials often have various defects, or there is damage due to various treatments. Therefore, it is also necessary to study some of the extrinsic properties of defects and damage, as well as to study the influence of these defects and damage on the intrinsic properties of the surface of the material, while trying to reveal the intrinsic characteristics of the semiconductor surface.