The atomic layer deposition (ALD) technique is a surface-controlled and layer-by-layer process,relying on two sequential self terminating half-reactions,offering unmatched precision in terms of controlling the ratio and morphology of the crystalline and amorphous phases of deposited materials.[1-4] Thus,ALD shows significant promise for synthesis of anodes and cathodes and ultra-thin film coating layers on active electrodes in lithium ion batteries (LIBs).The charge cutoff voltage over 4.2 V incurred the dissolution of LiCoO2 into the electrolyte,thereby causing an increased capacity fade upon cycling.ALD derived coatings were employed to mitigate the capacity fading of LiCoO2 in order to satisfy LIB application.