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5. Effect of Ion-Beam Bombardment on Exchange Bias of NiO/NiFe Bilayers During Film Growth Process

Effect of Ion-Beam Bombardment on Exchange Bias of NiO/NiFe Bilayers During Film Growth Process

来源 :The 8th Asian-European International Conference on Plasma Su | 被引量 : 0次 | 上传用户：suc

【作 者】

：

G.J.Li C.W.Leung H.R.Huang K.W.Lin P.T.Lai P.W.T.Pong 

【机 构】

：

Department of Electrical and Electronic Engineering,The University of Hong Kong,Hong Kong

【出 处】

：

The 8th Asian-European International Conference on Plasma Su

【发表日期】

：

2011年1期

【关键词】

：

Exchange bias Ion beam bombardment Antiferromagnetic NiO 

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