Nanoscale Depth and Surface Roughness Controlled by Low Energy Ion Beam Lithography.

来源 :International Conference on Experimental Mechanics 2008(ICEM | 被引量 : 0次 | 上传用户：ye14382163

【作者】

：

S.A.Pahlovy I.Miyamoto J.Taniguchi K.Junki N.Motoyuki S.Momota Y.Nojiri

【机构】

：

Department of applied electronics, Tokyo University of Science, Noda, Chiba 278-8510, Japan

【出处】

：

International Conference on Experimental Mechanics 2008(ICEM

【发表日期】

：

2008年1期

【关键词】

：

fabrication smoothing surface ion dose surface roughness and etching effect

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Nanoscale Depth and Surface Roughness Controlled by Low Energy Ion Beam Lithography.

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