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Thermal doping method using furnace is generally used for solar-cell wafer doping.It takes a lot of time and high cost.
Study of wafer doping for solar-cell using atmospheric pressure micro-plasma
【摘 要】
：
Thermal doping method using furnace is generally used for solar-cell wafer doping.It takes a lot of time and high cost.
【机 构】
：
Department of Electrophysics, Kwangwoon, Wallgye-Dong, Nowon-Gu, Seoul, Korea
【出 处】
：
2011年第三届微电子及等离子体技术国际会议
【发表日期】
：
2011年9期
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