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Si-C-N hard films with various compositions were synthesized by sputtering independent Si and C targets in Ar/N2 plasma using an plasma enhanced magnetron sputtering system.It was found that the structure,mechanical and wearing properties of Si-C-N films were very sensitive to the chemical composition.XRD and TEM analysis revealed that the film with lower Si and higher C concentrations had a microstructure with nanocrystals and amorphous.And it of course had a better mechanical property.The micro hardness could exceed 40 GPa,and the fabrication coefficient was only about 0.2.The research on Si-C-N hard films revealed that the microstructure with nanocrystals surrounding by the amorphous matrix have the best mechanical properties.