Hot filament chemical vapor deposition (HF-CVD) has been widely explored as a method for growing various allotropes of carbon which include diamond and diamond like carbon films, carbon nanotubes and amorphous graphite.Until recently there have been few reports of depositing graphene using HF-CVD.We have attempted to deposit monolayer graphene using conventional HF-CVD methods.Our method includes varying parameters such as H2/CH4 ratio, process pressure, substrate exposure time, temperature and sample/filament distance.Our efforts to grow and characterize uniform thin films of graphene on non-catalytic surfaces will be discussed.