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采用反应烧结制备的碳化硅制品通常含有10%~20%的Si,由于Si与Si C两种材料的物理性能存在差异,在镜面的抛光过程中两种材料的去除速率不一致,导致制品出现缺陷,其表面粗糙度通常无法满足空间遥感用反射镜的光学应用要求,为此本研究采用化学气相沉积(CVD)及物理气相沉积(PVD)对镜面进行改性,通过SEM分析了2种改性涂层与基体的结合性能,采用分光光度计分析两种改性材料的反射效果,实验表明采用无缺陷的CVDSiC和PVDSi涂层都适宜做Si-SiC反射镜改性涂层,在此基础上对不同温度及不同位置下制备的碳化硅涂层进行分析,对CVD过程的化学动力及气体流场对膜层的影响进行初步分析讨论,为CVD工艺制备大尺寸SiC涂层提供依据。
Silicon carbide products prepared by reaction sintering usually contain 10% -20% Si. Due to the difference in physical properties between Si and Si C, the removal rates of the two materials are inconsistent in the mirror polishing process, resulting in defects of the products , The surface roughness usually can not meet the optical application requirements of remote sensing mirrors. Therefore, in this study, the mirror surface was modified by chemical vapor deposition (CVD) and physical vapor deposition (PVD) The combination of the coating and the substrate, the use of spectrophotometer analysis of two kinds of modified material reflection effect, experiments show that the use of defect-free SiCSiC and PVDSi coatings are suitable for Si-SiC mirror coating modified, on this basis The SiC coatings prepared at different temperatures and locations were analyzed. The chemical kinetics of CVD process and the influence of gas flow on the coatings were analyzed and discussed. The results provide the basis for preparing SiC coatings with large size.