Titanium dioxide (TiO2) films have been studied extensively due to their outstanding physical and chemical properties,and are used in such fields as photovoltaics,photocatalysis,electrochromics and se
Heavily Nb-doped SrTiO3 (STNO) heteroepitaxial films have been successfully grown on (001) LaAlO3 (LAO) single crystal substrate by ion beam deposition method with a microwave ion source.
As semiconductor devices are scaled down,Cu interconnects become the best way due to its good electromigration resistance,and low electrical resistivity (1.67μΩ cm).
Nickel thin films were deposited by plasma-enhanced atomic layer deposition (PE-ALD) by using metallorganic precursors and various reactant gases,H2 and NH3,including its plasma.