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High quality transparent conductive Ti-Al co-coped ZnO films deposited by DC magnetron sputtering at
【机 构】
：
School of science,Shandong University of Technology,Zibo 255049,China
【出 处】
：
第六届国际氧化锌及相关材料研讨会
【发表日期】
：
2010年4期
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