Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistan

来源 :LIMIS 2016——The 4th International Symposium on Laser Interac | 被引量 : 0次 | 上传用户：zhoupeng4348

【摘要】

：

An effective combined process of reaction ion etching (RIE) and dynamic chemical etching (DCE) is applied for significantly improving the damage resistance of fused silica optics while minimizing the

【作者】

：

Laixi Sun Jin Huang Hongjie Liu Xin Ye Xiaodong Jiang Liming Yang Wanguo Zheng Weidong Wu

【机构】

：

Research Centre of Laser Fusion, China Academy of Engineering Physics, Mianyang, 621900, China;Insti

【出处】

：

LIMIS 2016——The 4th International Symposium on Laser Interac

【发表日期】

：

2016年8期

【关键词】

：

laser damage material fused silica SSD etching

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　　An effective combined process of reaction ion etching (RIE) and dynamic chemical etching (DCE) is applied for significantly improving the damage resistance of fused silica optics while minimizing the removal amount.

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Combination of reaction ion etching and dynamic chemical etching for improving laser damage resistan

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