【摘 要】
：
The fabrication and characterization of fine silicon structures with high-quality etching profile and sidewall morphology have been increasingly demandedby
【机 构】
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Laboratory of Nanophotonic Functional Materials and Devices,Institute of Optoelectronic Material and
【出 处】
：
The 4th Advances in Optoelectronics and Micro/nano-optics (A
论文部分内容阅读
The fabrication and characterization of fine silicon structures with high-quality etching profile and sidewall morphology have been increasingly demandedby several fields,such as MEMS,microfluidic chips,polymer optical waveguides,and Lab-on-chip system,etc.
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