Influence of fabrication parameter on the nanostructure of SiNWs under HF/AgNO3/Fe (NO3)3 etching sy

来源 :2014中国功能材料科技与产业高层论坛 | 被引量 : 0次 | 上传用户：HOHOHO66

【摘要】

：

【作者】

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Yongyin Xiao Xiuhua Chen Wenhui Ma Shaoyuan Li Yuping Li Jiali He Hui Zhang Jiao Li

【机构】

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Faculty of Physical Science and Technology, Yunnan University, Kunming 650091, China

【出处】

：

2014中国功能材料科技与产业高层论坛

【发表日期】

：

2014年2期

【关键词】

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Silicon nanowires one-step MACE HF/AgNO3/Fe(NO3)3 etchant

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　　Large-area SiNWs has been successfully fabricated through one-step metal-assisted chemical etching process at room temperature.The effects of key fabrication parameters (AgNO3 concentration, Fe (NO3)3 concentration, and etching time) on the nanostructure SiNWs were carefully investigated by SEM, TEM, respectively.

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Influence of fabrication parameter on the nanostructure of SiNWs under HF/AgNO3/Fe (NO3)3 etching sy

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