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Development of ferroelectric thin film technology for uncooled infrared detector
【机 构】
:
NationalLaboratoryforInfraredPhysics,ShanghaiInstituteofTechnicalPhysics,CAS,Shanghai200083,China;Ke
【出 处】
:
The 2nd International Syposium on Innovations in Advanced Ma
【发表日期】
:
2008年7期
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