计算了适用于193nm增透膜设计与制备的基底与薄膜材料的光学常数,并在此基础上对193nm增透膜进行了设计、制备与性能分析.发现基底材料的吸收损耗对增透膜元件的影响很大,超过一定值时,增透膜元件的设计透过率将达不到理想水平.对单面增透膜的设计与制备结果表明,当吸收损耗降低到一定程度,散射损耗成为不可忽略的因素.采用热舟蒸发方法实现了性能良好的193nm减反射膜,剩余反射率在0.2%以下. The optical constants of the substrates and thin films suitable for the design and preparation of 193 nm AR coatings were calculated and the design, preparation and performance analysis of the 193 nm AR coatings were also carried out.It was found that the absorption loss of the substrate increased the transmittance of the AR coatings, Of the impact of a large, more than a certain value, the AR permeable membrane element design will not reach the desired level of transmission.A single AR coating design and preparation results show that when the absorption loss is reduced to a certain extent, the scattering loss becomes Non-negligible factors The 193nm anti-reflection film with good performance is realized by the thermal boat evaporation method, and the residual reflectance is below 0.2%.