本文提出发展蚀刻二元元件的工艺,其中最重要的是选择适当的蚀速比,它是制作具有连续厚度分布的浮雕型光刻全息图的关键,文中给出了反应功率一定时腐蚀气体流量和蚀刻速率的关系曲线,找到了合适的工作点,根据这些结果,制作成功性能优良的全息光学元件. In this paper, we propose to develop the process of etching binary components, of which the most important is to select the appropriate etching rate, which is the key to making the relief-type lithography hologram with continuous thickness distribution. In this paper, And the etching rate curve to find a suitable working point, based on these results, the successful production of holographic optical elements with excellent performance.