论文部分内容阅读
本文研究了Cu在Pt(100)台阶面和(110)单原子台阶的欠电位沉积.发现若不考虑阴离子吸附,初始阶段Cu在台阶面和台阶处的电沉积同时进行.在电沉积满单层的伏安曲线上,可以观察到若干峰.通过对峰电荷与台阶密度关系的分析,可认为这些峰分别对应于不同的沉积位点.较正电位的峰对应于Cu在台阶面上的电沉积,而在台阶处Cu的电沉积则因溶液中的阴离子而具有不同的伏安性质.此外,还发现Pt电极表面的Cu沉积电荷转移数接近2e,且沉积初始阶段阴离子覆盖度不变.
In this paper, the underpotential deposition of Cu on Pt (100) and (110) monatomic steps was studied, and it was found that the electrodeposition of Cu at the initial stage and the step at the initial stage was carried out at the same time without considering the anion adsorption. Layer on the voltammetry curve, we can observe a number of peaks.By analyzing the relationship between the peak charge and the step density, these peaks correspond to different deposition sites, respectively.The corresponding positive peak corresponds to the Cu Electrodeposited at the step, whereas the electrodeposition of Cu at the step has different voltammetric properties due to the anions in the solution.In addition, it is also found that the number of Cu-deposited charge transfer on the surface of the Pt electrode is close to 2e and the anion coverage is unchanged in the initial stage of deposition .