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应用ESCA、~(19)F-NMR和IR研究了六氟丙烯等离子体聚合膜的组成与结构,指出聚合膜的组成与结构,指出聚合膜是高度文化的,分子中有57％的季碳原子都连有CF_3基团。同时也找出了不同功率等离子体聚合情况下聚合膜组成变化规律,并用IR光谱对该规律进行了验证。发现在高极限功率下,聚合膜组成由于刻蚀反应而发生突变,主要形成较长的含F或无F的Si—O—Si链。
The composition and structure of the hexafluoropropylene plasma polymerization membranes were studied by ESCA, ~ (19) F-NMR and IR spectra. The composition and structure of the polymerization membranes were pointed out. The polymerization membranes were highly cultural with 57% quaternary carbon Atoms are attached to CF_3 groups. At the same time, the rules of the polymerization film composition under different power plasma conditions were also found, and the rule was verified by IR spectroscopy. It is found that at high ultimate power, the polymeric film composition undergoes a mutation due to the etching reaction, mainly forming a longer F-containing or F-free Si-O-Si chain.