论文部分内容阅读
纳米压印模板通常采用极紫外光刻、聚焦离子束光刻和电子束光刻等传统光刻技术制备,成本较高.寻找一种简单、低成本的纳米压印模板制备方法以提升纳米压印光刻技术的应用成为研究的重点与难点.本文以多孔氧化铝为母模板,采用纳米压印光刻技术对纳米多孔硅模板的制备进行了研究.在硅基表面成功制备出纳米多孔阵列结构,孔间距为350—560 nm,孔径在170—480 nm,孔深为200 nm.在激发波长为514 nm时,拉曼光谱的测试结果表明,相对于单面抛光的硅片,纳米多孔结构的硅模板拉曼光强有了约12倍左右的提升,对提升硅基光电器件的应用具有重要的意义.最后,利用多孔硅模板作为纳米压印母模板,通过热压印技术,成功制备出了聚合物纳米柱软模板.
The nanoimprint template is usually prepared by traditional photolithography such as extreme ultraviolet lithography, focused ion beam lithography and electron beam lithography, and the cost is high. A simple and low-cost method for preparing a nano-imprint template is proposed to improve the nano-pressure The application of printing lithography has become the research focus and difficulty.In this paper, the porous alumina as the master template, the use of nanoimprint lithography for the preparation of nano-porous silicon template was successfully prepared on the surface of the silicon nanoporous array The results show that the Raman spectra show that the Raman spectra at 350-560 nm and 170-480 nm in diameter and 200 nm at the excitation wavelength of 514 nm indicate that the Raman spectra of the nano-porous The Raman intensity of the Si template is about 12 times higher than that of the Si template, which is of great significance for the improvement of the application of the Si-based photovoltaic device.Finally, the porous Si template is used as the nanoimprint mother template, A flexible template of polymer nanorods was prepared.