论文部分内容阅读
本文研究了用于制作磁光盘的稀土─过渡族金属合金溅射靶材的制备工艺。制备了尺寸为Φ１００×３～５ｍｍ的ＤｙＦｅＣｏ、ＮｄＤｙＦｅＣｏ、ＧｄＴｂＦｅＣｏ和ＴｂＦｅＣｏ等稀土合金靶。对制备的铸态稀土合金及粉末烧结靶中的氧含量、显微组织进行了初步分析。此外，还讨论了稀土─过渡族金属合金溅射靶的材料特性和要求。
In this paper, we study the preparation process of rare earth-transition metal alloy sputtering targets for magneto-optical disks. The rare earth alloy targets such as DyFeCo, NdDyFeCo, GdTbFeCo and TbFeCo with size of 100 × 3 ~ 5mm were prepared. The oxygen content and microstructure of as-cast as-cast rare earth alloy and powder sintered target were analyzed preliminarily. In addition, the material properties and requirements of rare earth-transition metal alloy sputtering target are also discussed.