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为实现纳米三坐标测量机(NMM)中大范围高精度位移的测量(测量范围小于40mm,分辨率小于0.1nm),研制了一种大量程纳米级测量精度的实用化外差干涉仪,并对该干涉仪的光学结构进行分析研究。该系统不但克服了双频激光干涉仪混频的固有缺点,而且在结构上利用光学器件的偏振特性,使系统具有共光路、等光程、光学倍程和相位差成90°正交信号等特点,提高了系统分辨率、抗干扰性能和精度。该系统在40mm的测量范围内,具有λ/4 096的分辨率和纳米级的测量精度。实验结果表明,纳米三坐标测量机对样板1次安装10次测量的实验标准差为4.9nm,10次安装10次测量的实验标准差为8.4nm,具有较好的测量重复性。干涉仪结构符合三坐标的测量要求,可安装在纳米三坐标测量机等仪器中,也可用于高精度的位移测量。
In order to realize the measurement of a wide range of high-precision displacements (less than 40 mm in measurement range and less than 0.1 nm in resolution) in a nanometer coordinate measuring machine (NMM), a practical heterodyne interferometer with a large range of nanometer-scale measurement accuracy was developed. The optical structure of the interferometer is analyzed. The system not only overcomes the inherent shortcomings of the dual-frequency laser interferometer, but also makes use of the polarization characteristics of optics structure to make the system have a common optical path, such as optical path, optical multiple and phase difference of 90 ° orthogonal signal Features, improved system resolution, anti-jamming performance and accuracy. The system has a resolution of λ / 4 096 and nanometer-scale measurement accuracy over a measurement range of 40 mm. The experimental results show that the experimental standard deviation of nano CMM for 10 times of single-stage installation of the sample is 4.9 nm, and the standard deviation of experiment for 10 times of 10 times of installation is 8.4 nm, which has good repeatability of measurement. Interferometer structure in line with the three-coordinate measurement requirements can be installed in the nano-coordinate measuring machines and other equipment, can also be used for high-precision displacement measurement.