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采用电子束蒸发、射频磁控溅射、等离子喷涂等方法,在镍基高温合金基底上制备YSZ(质量分数12%Y2O3稳定的Zr O2)、Al2O3复合薄膜结构绝缘层,并研究了复合薄膜结构绝缘层在室温到800℃范围内的绝缘特性,以及高温对复合薄膜晶体结构和表面形貌的影响。结果表明:晶态YSZ/非晶态YSZ/Al2O3结构绝缘层在室温下的绝缘电阻大于1.2 GΩ,在800℃大气环境下有150 kΩ左右的绝缘电阻。在室温到800℃范围内,随温度升高其绝缘电阻呈近指数下降的变化规律。经过在800℃大气环境中热处理8 h,YSZ的立方相结构未发生改变,Al2O3表面十分致密,表明该复合结构绝缘层薄膜具有良好的高温绝缘性能和稳定性。
YSZ (ZrO2 mass fraction of ZrO2 stabilized at 12% Y2O3) and Al2O3 composite film were prepared on nickel-base superalloy substrate by electron beam evaporation, RF magnetron sputtering and plasma spraying. The structure of the composite film was also studied The insulating properties of the insulating layer in the range of room temperature to 800 ° C, and the effect of high temperature on the crystal structure and the surface topography of the composite thin film. The results show that the insulation resistance of crystalline YSZ / amorphous YSZ / Al2O3 structure insulating layer is greater than 1.2 GΩ at room temperature and about 150 kΩ at 800 ℃. In room temperature to 800 ℃ range, with the temperature rise of its insulation resistance showed a nearly exponential decline in the law. After the heat treatment at 800 ℃ for 8 h, the cubic phase structure of YSZ did not change, and the surface of Al2O3 was very dense, indicating that the composite insulating film had good high temperature insulation and stability.