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在工作压力为2 psi(1 psi=6 894.76 Pa)、抛光头转速为55 r/min、抛盘转速为60 r/min、流量为50 mL/min的条件下,对3英寸(1英寸=2.54 cm)的石英玻璃(99.99%)进行化学机械抛光(CMP)实验。分别研究了磨料质量分数(4%,8%,12%,16%,20%)、FA/OⅠ型螯合剂体积分数(1%,2%,3%,4%,5%)和FA/O型活性剂体积分数(1%,2%,3%,4%,5%)对石英玻璃化学机械抛光去除速率的影响。实验结果表明:随着磨料质量分数增加,石英玻璃去除速率明显提高,从11 nm/min提升到97.9 nm/min,同时表面粗糙度(Ra)逐渐降低,从2.950 nm降低到0.265 nm;FA/OⅠ型螯合剂通过化学作用对去除速率有一定的提高,Ra也有一定程度的减小,能够降低到0.215 nm;FA/O型活性剂的加入会导致去除速率有所降低,但是能够使Ra进一步降低至0.126 nm。最终在磨料、FA/OⅠ型螯合剂、FA/O型活性剂的协同作用下,石英玻璃去除速率达到93.4 nm/min,Ra达到0.126 nm,远小于目前行业水平的0.9 nm。
The operating pressure was 2 psi (1 psi = 6 894.76 Pa), the polishing head speed was 55 r / min, the selling speed was 60 r / min and the flow rate was 50 mL / min. cm) quartz glass (99.99%) was subjected to a chemical mechanical polishing (CMP) experiment. The effects of the mass fraction of FA / OⅠchelator (1%, 2%, 3%, 4%, 5%) and FA / Effect of O-type active agent volume fraction (1%, 2%, 3%, 4%, 5%) on chemical mechanical polishing removal rate of quartz glass. The experimental results show that the removal rate of quartz glass increases from 11 nm / min to 97.9 nm / min and the surface roughness (Ra) decreases from 2.950 nm to 0.265 nm with the increase of abrasive mass fraction. The FA / The chelation of OⅠ chelator can improve the removal rate through chemical reaction, and the Ra can also be reduced to 0.215 nm. The addition of FA / O activator leads to the decrease of removal rate, but it can further increase the Ra Reduced to 0.126 nm. Finally, the synergistic effect of abrasive, FA / O Ⅰ chelator and FA / O activator, quartz glass removal rate reaches 93.4 nm / min and Ra reaches 0.126 nm, which is much smaller than the current industry standard of 0.9 nm.