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衍射波前质量是衡量刻划光栅性能的重要指标之一,光栅刻划机若存在阿贝误差,将直接影响刻线位置精度,从而影响光栅的波前质量。建立了刻划机阿贝误差与光栅衍射波前质量的物理模型,并分析了该误差对波前质量的影响。针对该误差设计了一种基于双频激光干涉测量的阿贝误差测量光路,测量了刻划机的阿贝误差,根据物理模型对其导致的光栅衍射波前误差作了仿真分析,并提出了基于双层工作台结构的误差控制校正方法。对两块尺寸为80mm×100mm、刻线密度为79groove/mm的中阶梯光栅进行了阿贝误差校正前后的对比刻划实验。结果表明,通过对阿贝误差的测量和校正,光栅闪耀级次为-36级的衍射波前误差由0.529λ降低至0.159λ(λ=632.8nm),有效地降低了阿贝误差对光栅衍射波前质量的影响。
The quality of the diffraction wavefront is one of the important indexes to measure the performance of the grating. Abbe errors of the grating scoring machine will directly affect the position accuracy of the reticle, thus affecting the wavefront quality of the grating. The physical model of Aber error and grating diffraction wavefront quality of scoring machine was established, and the influence of the error on wavefront quality was analyzed. According to the error, an Abbe error measurement optical path based on dual-frequency laser interferometry was designed. The Abbe error of the scoring machine was measured. The wavefront aberration caused by grating aberration was simulated and analyzed based on the physical model. Error Control and Correction Method Based on Double Stage Workbench Structure. Contrast scoring experiments were carried out before and after Abbess error correction on two middle scale gratings with the dimensions of 80mm × 100mm and groove density of 79groove / mm. The results show that the aberration of the diffraction grating with diffraction order of -36 is reduced from 0.529λ to 0.159λ (λ = 632.8nm) by measuring and correcting the abbe error, which effectively reduces the Abbe error to the grating diffraction The influence of wavefront quality.