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采用X射线光电子能谱仪 (XPS)和扫描透射电镜 (STEM )分析了在Al薄膜基材上磁控溅射沉积U薄膜的表面形貌、组织和结构 ;分别采用排代法、霍美尔 (T2 0S)粗糙度测量仪测量了薄膜的密度和表面粗糙度。结果表明 :溅射沉积的U薄膜由金属U和少量UO2 组成 ,薄膜结构属微晶和无定形态 ,密度是块材密度的 (75± 5 ) % ,表面粗糙度小于 0 3 μm。
The surface morphology, microstructure and structure of U film deposited by magnetron sputtering on Al thin film substrate were analyzed by X-ray photoelectron spectroscopy (XPS) and scanning transmission electron microscopy (STEM). The displacement, (T2 0S) roughness meter measured the film density and surface roughness. The results show that the sputtered U - film consists of U and a small amount of UO2. The film structure is microcrystalline and amorphous. The density is (75 ± 5)% of the bulk density and the surface roughness is less than 0 3 μm.