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在沉积不锈钢-氮化铝(SS-AlN)金属陶瓷太阳吸收集热管的磁控溅射三靶镀膜机上,安装了UPS03反应溅射闭环控制单元,实现反应溅射Al2O3稳定反馈控制。采用国产直流电源在Al靶表面处于过渡态下,成功制备了吸收几乎为零的Al2O3薄膜。溅射功率在14kW时,反应溅射沉积Al2O3的靶电压波动可长时间稳定控制在±3 V范围内,沉积速率为5.4 nm/(min·kW),约为Al靶在无反应气体溅射下沉积Al薄膜速率的74%。采用Al2O3代替AlN作为减反射层,应用到SS-AlN太阳选择性吸收涂层中,进一步提高了复合膜的太阳光学性能,太阳吸收比由AlN作为减反射层的0.956提高到0.965,红外发射比不变,仍为0.044。
In the deposition of stainless steel - aluminum nitride (SS-AlN) cermet solar absorption tube magnetron sputtering three target coating machine installed UPS03 reactive sputtering closed-loop control unit to achieve reactive sputtering Al2O3 stabilized feedback control. Using domestic DC power source in the Al target surface in the transition state, the successful preparation of nearly zero absorption Al2O3 film. When the sputtering power is 14kW, the target voltage fluctuation of reactive sputter deposited Al2O3 can be stably controlled within ± 3 V for a long time, and the deposition rate is 5.4 nm / (min · kW) Deposited 74% of the Al film rate. The use of Al2O3 instead of AlN as the anti-reflection layer, applied to the SS-AlN solar selective absorption coating, to further improve the solar optical properties of the composite film, the solar absorption ratio from 0.956 AlN antireflection layer increased to 0.965, infrared emission ratio Unchanged, still 0.044.