本文探讨了在HFCVD(hotfilamentchemicalvapordeposition)沉积金刚石薄膜中热丝数量、位置等几何参数对温度场和辐射场的影响。利用系统热传递模型和计算机辅助的数值解方法得到了该方法沉积大面积金刚石薄膜中衬底表面温度分布和热辐射能量密度分布。发现金刚石薄膜的均匀性受热辐射能量密度分布影响较大。进一步给出了沉积面积为 10 0mm× 10 0mm的金刚石薄膜的最佳参数。 In this paper, the influence of geometrical parameters such as the number and location of hot wire on the temperature field and the radiation field in the deposition of diamond films by HFCVD (hot-melt chemical vapor deposition) is discussed. The surface temperature distribution and heat radiation energy density distribution of the deposited diamond film on a large area were obtained by using the system heat transfer model and the computer-aided numerical solution method. It is found that the uniformity of the diamond film is greatly influenced by the heat radiation energy density distribution. The optimal parameters of the diamond film with a deposition area of ​​10 × 10 10 mm are further given.