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采用有限元方法分析了激光清洗过程中基片表面的温度分布，研究了激光清洗过程中清洗阈值和损伤阈值存在的原因，推导出使用波长为３０８ｎｍ，脉宽为２８ｎｓ的准分子激光清洗硅片表面油脂的清洗阈值和损伤阈值，并进行了实验验证，其理论清洗阈值与实验结果是符合的
The temperature distribution on the surface of the substrate during the laser cleaning process was analyzed by finite element method. The reasons for the presence of the cleaning threshold and the damage threshold during the laser cleaning process were studied. The excimer laser was used to clean the wafer with a wavelength of 308 nm and a pulse width of 28 ns. Surface oil cleaning threshold and damage threshold, and the experimental verification, the theoretical cleaning threshold and the experimental results are consistent