对用不同方法制备的软Ｘ光激光实验用的Ａｌ衰减膜样品，用Ａｕｇｅｒ电子能谱（ＡＥＳ）结合氩离子束刻蚀进行了组分的表面和深度分布分析，结果表明表面氧化层主要由Ａｌ２Ｏ３组成，氧化达到饱和时的氧化层厚度≈７．５ｎｍ。由于在软Ｘ光波段内，氧的吸收系数比铝大一个多数量级，这一氧化层对软Ｘ光透过率的影响甚大。将ＡＥＳ测试结果作为参数，使用公式Ｉ＝Ｉ０·ｅｘｐ［－μ（Ｅ）·（ρｄ）］对Ｘ光透过强度进行修正。同步辐射软Ｘ光对样品透过率的直接测量表明，对于透过率大于２０％的Ａｌ膜，直接测量结果与按修正公式计算的结果在最大偏差１１％范围内符合。 The surface and depth distribution of the samples were analyzed by Auger electron spectroscopy (AES) combined with argon ion beam etching. The results showed that the surface oxide layer mainly consisted of Al2O3 composition, oxidation oxide thickness reached saturation ≈ 7.5nm. Since the absorption coefficient of oxygen is one order of magnitude larger than that of aluminum in the soft X-ray band, this oxide layer has a great influence on the soft X-ray transmittance. Using the AES test results as a parameter, the X-ray transmission intensity is corrected using the formula I = I0 · exp [-μ (E) · (ρd)]. Direct measurement of synchrotron soft X-ray transmittance of the sample showed that for Al films with a transmittance greater than 20%, the direct measurement results were in agreement with the results calculated by the correction formula within a maximum deviation of 11%.