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利用脉冲多弧离子镀技术在硅基片上沉积类金刚石薄膜．分析了类金刚石薄膜的牢固度与各种工艺条件的关系．实验结果表明：基片的清洗、基片温度、主回路电压、脉冲频率、烘烤处理都强烈影响类金刚石薄膜的牢固度．同时从理论上分析了利用离子束辅助蒸发工艺可以进一步提高类金刚石薄膜的牢固度
Diamond - like carbon films were deposited on silicon substrates by pulsed multi - arc ion plating. The relationship between the firmness of diamond-like carbon films and various process conditions was analyzed. The experimental results show that the substrate cleaning, substrate temperature, main circuit voltage, pulse frequency and baking treatment all strongly affect the firmness of diamond-like carbon films. At the same time, it is theoretically analyzed that the ion beam-assisted evaporation process can further improve the fastness of the diamond-like carbon film