论文部分内容阅读
目的:比较不同浓度H2O2对镍铬合金电化学腐蚀性能及离子析出的影响。方法:应用电化学工作站的电化学阻抗谱法和动电位极化曲线法,对不同浓度H2O2浸泡112 h后的牙科镍铬合金在人工唾液中的腐蚀行为进行比较,并用电感耦合等离子体质谱仪检测电化学腐蚀后人工唾液介质中析出的金属离子浓度。采用SPSS 13.0软件包对数据进行方差分析。结果:0%H2O2浸泡112 h后,镍铬合金在人工唾液中等效电路极化电阻Rct、腐蚀电位Ecorr、点蚀击穿电位Eb以及代表合金表面的“伪钝化”的△E(Ecorr与Eb之差)最大,而30%H2O2浸泡112 h后,镍铬合金在人工唾液中的Rct、Ecorr、Eb以及△E最小,不同浓度H2O2浸泡后镍铬合金耐腐蚀性能顺序为30%<10%<0%(P<0.05);镍铬合金在人工唾液介质中析出的金属离子Ni、Cr、Mo浓度大小顺序为0%<10%<30%(P<0.05)。结论:镍铬合金在不同浓度H2O2中浸泡112 h后,其在人工唾液中的耐腐蚀性能发生了一定变化,随着H2O2浓度的升高,越来越容易腐蚀,且人工唾液介质中析出的金属离子浓度也越来越高。
Objective: To compare the effects of different concentrations of H2O2 on the electrochemical corrosion and ion precipitation of Ni-Cr alloy. Methods: Electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization curves were used to compare the corrosion behavior of dental Ni-Cr alloy in artificial saliva after soaking for 112 h at different H2O2 concentrations. The results of ICP-MS / The concentration of metal ions precipitated in the artificial saliva medium after electrochemical corrosion was measured. Data were analyzed for variance using SPSS 13.0 software package. RESULTS: After soaking in 0% H2O2 for 112 h, the equivalent circuit polarization resistance Rct, corrosion potential Ecorr, pitting breakdown potential Eb and the “pseudo-passivation” △ E of the alloy surface The difference between Ecorr and Eb was the largest, while the Rct, Ecorr, Eb and △ E of Ni-Cr alloy were the lowest in artificial saliva after soaking in 30% H2O2 for 112 h. The corrosion resistance of Ni-Cr alloy after soaking in H2O2 was 30% <10% <0% (P <0.05). The concentrations of Ni, Cr and Mo in Ni-Cr alloy in the saliva medium were 0% <10% <30% (P <0.05). CONCLUSION: The Ni-Cr alloy has some changes in the corrosion resistance of artificial saliva after being immersed in different concentrations of H2O2 for 112 h. With the increase of H2O2 concentration, the corrosion resistance of the Ni-Cr alloy is more and more easily corroded, and the precipitation in the artificial saliva medium Metal ion concentration is getting higher and higher.